What are the characteristics of Molybdenum Target?
As we all know, molybdenum has the characteristics of high melting point, high conductivity, low specific impedance, good corrosion resistance and environmental protection.
Therefore, molybdenum target materials are widely used in the electronics industry, such as flat-panel displays, thin-film solar cell electrodes and wiring materials.
Next, Yoyo will introduce you to the characteristics of molybdenum targets.
High Purity
The higher the purity of the molybdenum target, the better the performance of the sputtered film. Generally, the purity of molybdenum sputtering targets must reach at least 99.95%.
However, the size of the glass substrate in the LCD industry is increasing, and the purity of the molybdenum target has also been improved for the uniformity of the film and the quality of the wiring.
Therefore, the purity of the target material is required to be 99.99%-99.999%, depending on the size of the glass substrate and the use environment,
High Density
During coating, when the low-density sputtering target is bombarded, the gas in the pores of the target material is released, and large-size particles splash. Or, the film-forming material is bombarded by secondary electrons, causing particles to splash.
These particles will reduce the quality of the film.
In order to reduce the pores in the target material and improve the performance of the film, the sputtering target material should have a high density.
For molybdenum sputtering targets, the relative density should be above 98%.
Grain Size
The molybdenum sputtering target has a polycrystalline structure, with grains ranging from microns to millimeters.
The sputtering rate of small grain targets is faster than that of coarse grains.
Moreover, the smaller the difference in grain size, the more uniform the thickness distribution of the deposited film.
Yolo: Uniform particle size
Some others particle
Crystal direction
During sputtering, target atoms are easily sputtered out along the hexagonal direction of the atoms.
Therefore, in order to achieve the sputtering rate, the crystalline structure of the target is also important.
The crystalline direction of the target also has a greater impact on the thickness uniformity of the sputtered film.
Therefore, obtaining a target structure with a certain crystal orientation is very important for the sputtering process of the film.
Thermal conductivity
Generally, during the sputtering process, in order to make the target and the chassis in good thermal conductivity, the molybdenum target must be connected to the oxygen-free copper chassis before sputtering. Aluminum is also possible.
After binding, ultrasonic inspection ensures that the unbound area of the two is less than 2%. In this way, the high-power sputtering can be satisfied without the combination falling off.
Yolo's molybdenum target performance
Purity:
Pure molybdenum: ≥ 99.95%,
High-temperature molybdenum: ≥99% (doped with rare earth elements)
Density: ≥10.2g/cm3
Melting point: 2610℃
Specifications: round target, plate target, rotating target
Applicable environment: vacuum environment or inert gas protection environment,
Pure molybdenum is resistant to high temperature of 1200 degrees, molybdenum alloy is resistant to high temperature of 1700 degrees
English
العربية
Nederlands
Français
Deutsch
Italiano
Português
Русский
Español